Photo-resist spinner
Equipment
The image describes a photo-resist spinner designed by the Department of Electrical Engineering, IIT Madras. This equipment was specially designed and developed for applying thin and uniform coating of a photo-resist material on various substrates. It is intended for applications in the R and D and manufacture of semi-conductor devices like transistors, diodes, I.Cs and thin film devices. It can also be used for coating thin layers of any other liquid material.
Similar photographs can be found in album 0329: 001/0329/IMG_105828 & 001/0329/IMG_105836
Collection:
Central Photographic Section Collection
Album Name:
Photograph ID:
001/0040/IMG_1208_1
Album ID:
Date:
January 1976
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