Photo-resist spinner
Equipment
The image describes a photo-resist spinner designed by the Department of Electrical Engineering, IIT Madras. This equipment was specially designed and developed for applying thin and uniform coating of a photo-resist material on various substrates. It is intended for applications in the R and D and manufacture of semi-conductor devices like transistors, diodes, I.Cs and thin film devices. It can also be used for coating thin layers of any other liquid material.
Collection:
Central Photographic Section Collection
Album Name:
Photograph ID:
001/0040/IMG_1207_1
Album ID:
Date:
January 1976
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